Concepedia

Author

B. Mertens

Carl Zeiss (Germany)

Also Known As

B. Mertens, B.M. Mertens, Bas Mertens

15

Publications

290

Citations

10

H-Index

54

Concepts

All Affiliations

Carl Zeiss (Germany)ASML (Netherlands)Netherlands Organisation for Applied Scientific ResearchPhysikalisch-Technische BundesanstaltPhilips (Netherlands)
BM

About

B. Mertens is an author at Carl Zeiss (Germany) specializing in engineering, applied physics, and instrumentation.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

8

8

223

2

Applied Physics

7

7

188

3

Natural Sciences

2

2

32

4

Health Sciences

1

1

11

5

Chemical Engineering

1

1

21

B. Mertens

×

10

Publications

277

Citations

10

H-Index

YearCitations

First performance results of the ASML alpha demo tool

H. Meiling, H.C. Meijer, Vadim Banine,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2006

78

Molecular contamination mitigation in EUVL by environmental control

N.B. Koster, B. Mertens, R. Jansen,

Microelectronic Engineering

2002

35

J-dependence in reactions on 24Mg, 28Si and 30Si

H. Kattenborn, C. Mayer‐Böricke, B. Mertens

Nuclear Physics A

1969

34

Mitigation of surface contamination from resist outgassing in EUV lithography

B. Mertens, B. van der Zwan, P.W.H. de Jager,

Microelectronic Engineering

2000

29

<title>Prevention of MoSi multilayer reflection loss in EUVL tools</title>

H. Meiling, B. Mertens, F. Stietz,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2001

21

j-dependence in reactions on 24Mg, 28Si and 30Si

B. Mertens, C. Mayer‐Böricke, H. Kattenborn

Nuclear Physics A

1970

20

Optical-model analysis for 3He scattering from some light nuclei in the energy range 18–20 MeV

H. Kattenborn, C. Mayer‐Böricke, B. Mertens

Nuclear Physics A

1968

20

EUV time-resolved studies on carbon growth and cleaning

B. Mertens, B. T. Wolschrijn, R. Jansen,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2003

17

Experimental results of the stochastic Coulomb interaction in ion projection lithography

P.W.H. de Jager, G. Derksen, B. Mertens,

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

1999

12

<title>Lifetime testing of EUV optics using intense synchrotron radiation at the PTB Radiometry Laboratory</title>

R. Klein, Alexander Gottwald, Frank Scholze,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2001

11

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