S. Wang is an author at ASML (Netherlands) specializing in optoelectronics, electrical engineering, and instrumentation.
Top concepts
EngineeringApplied PhysicsInstrumentationOptoelectronicsMicroelectronicsMicrofabricationElectronic PackagingElectrical EngineeringElectronic Engineering
Publications per year
2012–2012
1
1
EUV resist performance: current assessment for sub-22-nm half-pitch patterning on NXE:3300
Tom Wallow, Deniz Civay, S. Wang et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 25 citations
Euv Resist Performance, Engineering, Electron-beam Lithography +16
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