Bernhard Kneer

EUV lithography optics for sub-9nm resolution

Bernhard Kneer, Sascha Migura, Winfried Kaiser et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 66 citations

The future of EUV lithography: enabling Moore's Law in the next decade

Alberto Pirati, Jan van Schoot, Kars Troost et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 61 citations

High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond

Jan van Schoot, Eelco van Setten, Gijsbert Rispens et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2017 · 54 citations

Projection Lithography Systems, Optical Engineering, Short Wavelength Optic +19

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Kafai Lai, Alan E. Rosenbluth, Saeed Bagheri et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 47 citations

Electrical Engineering, Pixelated Illumination, Engineering +15

Anamorphic high-NA EUV lithography optics

Sascha Migura, Bernhard Kneer, Jens Timo Neumann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 29 citations