Improvements in resist performance towards EUV HVM

Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels, +8

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringEngineeringSpecific ResistanceResistorMicrofabrication +12

High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond

Jan van Schoot, Eelco van Setten, Gijsbert Rispens, +5

Journal of Micro/Nanolithography MEMS and MOEMS

Projection Lithography SystemsOptical EngineeringShort Wavelength OpticOptical MaterialsEngineering +17

Contrast optimization for 0.33NA EUV lithography

Jo Finders, Sander F. Wuister, Thorsten Last, +5

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMicroscopyOptic DesignBeam Lithography +15

Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography

Eelco van Setten, Gerardo Bottiglieri, Laurens de Winter, +8

Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists

Ruben Maas, M.-Claire van Lare, Gijsbert Rispens, +1

Journal of Micro/Nanolithography MEMS and MOEMS

Metal-oxide-based ResistsShort Wavelength OpticOptical MaterialsEngineeringElectron-beam Lithography +20

Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography

Elizabeth Buitrago, Seiji Nagahara, Oktay Yildirim, +15

Journal of Micro/Nanolithography MEMS and MOEMS

Novel high sensitivity EUV photoresist for sub-7nm node

Tomoki Nagai, Hisashi Nakagawa, Takehiko Naruoka, +15

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyImage SensorPhotoelectric SensorBeam Lithography +16

Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300

Lieve Van Look, Joost Bekaert, Andreas Frommhold, +3

EngineeringElectron-beam LithographyMicroscopyInterconnect (Integrated Circuits)Cd Variability +17

Progress in EUV resists towards high-NA EUV lithography

Xiaolong Wang, Zuhal Taşdemir, Iacopo Mochi, +7

High ResolutionEngineeringElectron-beam LithographyEuv ResistsChemistry +14

Challenge toward breakage of RLS trade-off for EUV lithography by Photosensitized Chemically Amplified Resist (PSCAR) with flood exposure

Seiji Nagahara, Michael Carcasi, Hisashi Nakagawa, +23

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE