Gijsbert Rispens

Improvements in resist performance towards EUV HVM

Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations · Full text

Electrical Engineering, Engineering, Specific Resistance +14

High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond

Jan van Schoot, Eelco van Setten, Gijsbert Rispens et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2017 · 54 citations

Projection Lithography Systems, Optical Engineering, Short Wavelength Optic +19

Contrast optimization for 0.33NA EUV lithography

Jo Finders, Sander F. Wuister, Thorsten Last et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 31 citations

Engineering, Electron-beam Lithography, Microscopy +17

Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography

Eelco van Setten, Gerardo Bottiglieri, Laurens de Winter et al. · 2017 · 25 citations

Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists

Ruben Maas, M.-Claire van Lare, Gijsbert Rispens et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2018 · 25 citations · Full text

Metal-oxide-based Resists, Short Wavelength Optic, Optical Materials +22