Thorsten Last is an author at ASML (Netherlands) specializing in engineering, ophthalmology, and computational imaging.
Top concepts
EngineeringOphthalmologyMicroscopyApplied PhysicsComputational ImagingOptical PropertiesPhysicsMedicineRadiologyOptoelectronics
Publications per year
2004–2021
9
9
Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner
Mark van de Kerkhof, Hans Jasper, Leon Levasier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 81 citations
Sub-10nm Node Lithography, Engineering, Electron-beam Lithography +16
Jo Finders, Laurens de Winter, Thorsten Last · Journal of Micro/Nanolithography MEMS and MOEMS · 2016 · 41 citations
Optical Materials, Engineering, Electron-beam Lithography +21
Accelerating quantum computer developments
Garrelt Alberts, M. A. Rol, Thorsten Last et al. · EPJ Quantum Technology · 2021 · 23 citations · Full text
Mature Supply Chain, Quantum Software, Quantum System Software +17
Rows per page
1–5 of 9