Thorsten Last

Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner

Mark van de Kerkhof, Hans Jasper, Leon Levasier et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 81 citations

Sub-10nm Node Lithography, Engineering, Electron-beam Lithography +16

Multi-component based cross correlation beat detection in electrocardiogram analysis

Thorsten Last, Chris Nugent, F. J. Owens · BioMedical Engineering OnLine · 2004 · 52 citations · Full text

Electrophysiological Evaluation, Engineering, Electrocardiogram Analysis +6

Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArF_iand extreme ultraviolet lithography

Jo Finders, Laurens de Winter, Thorsten Last · Journal of Micro/Nanolithography MEMS and MOEMS · 2016 · 41 citations

Optical Materials, Engineering, Electron-beam Lithography +21

Contrast optimization for 0.33NA EUV lithography

Jo Finders, Sander F. Wuister, Thorsten Last et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 31 citations

Engineering, Electron-beam Lithography, Microscopy +17

Accelerating quantum computer developments

Garrelt Alberts, M. A. Rol, Thorsten Last et al. · EPJ Quantum Technology · 2021 · 23 citations · Full text

Mature Supply Chain, Quantum Software, Quantum System Software +17