Concepedia
Statistics
Publications
10
Citations
358
H-Index
Active since
2015
Affiliations
Carl Zeiss (Germany)(Current)
ASML (Netherlands)
ASML (United States)
Sascha Migura is an author at Carl Zeiss (Germany) specializing in optics, numerical aperture, and digital imaging.
Publications per year
2015–2018
EUV lithography optics for sub-9nm resolution
Bernhard Kneer, Sascha Migura, Winfried Kaiser et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 66 citations
Natural Sciences, Physics, Biomedical Imaging +12
The future of EUV lithography: enabling Moore's Law in the next decade
Alberto Pirati, Jan van Schoot, Kars Troost et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 62 citations
Engineering, Electrical Engineering, Optics +12
EUV lithography scanner for sub-8nm resolution
Jan van Schoot, Koen van Ingen Schenau, Chris Valentin et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 61 citations
Engineering, Biomedical Engineering, Digital Imaging +8
High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond
Jan van Schoot, Eelco van Setten, Gijsbert Rispens et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2017 · 54 citations
Engineering, Materials Engineering, Physics +12
Anamorphic high-NA EUV lithography optics
Sascha Migura, Bernhard Kneer, Jens Timo Neumann et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 29 citations
Natural Sciences, Physics, Biomedical Imaging +11
1–5 of 10