Concepedia

Author

Sascha Migura

Carl Zeiss (Germany)

Also Known As

Germain, Sascha Migura

15

Publications

364

Citations

10

H-Index

24

Concepts

All Affiliations

Carl Zeiss (Germany)ASML (Netherlands)ASML (United States)
SM

About

Sascha Migura is an author at Carl Zeiss (Germany) specializing in ophthalmology, computational imaging, and microscopy.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

5

5

171

2

Health Sciences

4

4

117

3

Applied Physics

3

3

139

4

Computer Engineering

2

2

32

5

Medicine

1

1

54

Sascha Migura

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10

Publications

356

Citations

10

H-Index

YearCitations

EUV lithography optics for sub-9nm resolution

Bernhard Kneer, Sascha Migura, Winfried Kaiser,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2015

66

EUV lithography scanner for sub-8nm resolution

Jan van Schoot, Koen van Ingen Schenau, Chris Valentin,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2015

61

The future of EUV lithography: enabling Moore's Law in the next decade

Alberto Pirati, Jan van Schoot, Kars Troost,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2017

61

High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond

Jan van Schoot, Eelco van Setten, Gijsbert Rispens,

Journal of Micro/Nanolithography MEMS and MOEMS

2017

54

Anamorphic high-NA EUV lithography optics

Sascha Migura, Bernhard Kneer, Jens Timo Neumann,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2015

29

Imaging performance of EUV lithography optics configuration for sub-9nm resolution

Jens Timo Neumann, Matthias Rösch, Paul Gräupner,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2015

24

EUV High-NA scanner and mask optimization for sub 8 nm resolution

Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2015

20

High-NA EUV lithography enabling Moore’s law in the next decade

Jan van Schoot, Kars Troost, Frank Bornebroek,

2017

19

EUV high-NA scanner and mask optimization for sub-8nm resolution

Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri,

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

2016

12

The future of EUV lithography: continuing Moore's Law into the next decade

Jan van Schoot, Kars Troost, Frank Bornebroek,

2018

10

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