Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Mircea Dusa, John Quaedackers, Olaf F. A. Larsen, +12

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Wafer Scale ProcessingEngineeringElectron-beam LithographyBeam LithographyMicrofabrication +11

EUV lithography scanner for sub-8nm resolution

Jan van Schoot, Koen van Ingen Schenau, Chris Valentin, +1

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMicroscopyEuv Lithography ScannerOptic Design +19

EUV simulation extension study for mask shadowing effect and its correction

Hoyoung Kang, Steve Hansen, Jan van Schoot, +1

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Illumination ModelingPhotonicsElectrical EngineeringEngineeringElectron-beam Lithography +11

Mask error factor: causes and implications for process latitude

Jan B. van Schoot, Jo Finders, Koen van Ingen Schenau, +2

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMeasurementSpatial UncertaintyOptic Design +19

EUV source-mask optimization for 7nm node and beyond

Xiaofeng Liu, Rafael C. Howell, Stephen D. H. Hsu, +13

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Imaging performance of EUV lithography optics configuration for sub-9nm resolution

Jens Timo Neumann, Matthias Rösch, Paul Gräupner, +4

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringHigh ResolutionElectron-beam LithographyMicroscopy +19

EUV High-NA scanner and mask optimization for sub 8 nm resolution

Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri, +6

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

High ResolutionEngineeringMicroscopyEuv High-na ScannerOptic Design +20

Imaging performance of the EUV high NA anamorphic system

Koen van Ingen Schenau, Gerardo Bottiglieri, Jan van Schoot, +2

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Measuring resist-induced contrast loss using EUV interference lithography

Andreas Langner, Harun H. Solak, Roel Gronheid, +5

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringContrast LossOphthalmologyMicroscopyCalibration +12

EUV high-NA scanner and mask optimization for sub-8nm resolution

Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri, +6

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

High ResolutionEngineeringMicroscopyOptic DesignComputational Illumination +19