Koen van Ingen Schenau

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Mircea Dusa, John Quaedackers, Olaf F. A. Larsen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 87 citations

Wafer Scale Processing, Engineering, Electron-beam Lithography +13

EUV lithography scanner for sub-8nm resolution

Jan van Schoot, Koen van Ingen Schenau, Chris Valentin et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 61 citations

Engineering, Electron-beam Lithography, Microscopy +21

EUV simulation extension study for mask shadowing effect and its correction

Hoyoung Kang, Steve Hansen, Jan van Schoot et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 44 citations

Illumination Modeling, Photonics, Electrical Engineering +13

Mask error factor: causes and implications for process latitude

Jan B. van Schoot, Jo Finders, Koen van Ingen Schenau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 28 citations

Engineering, Electron-beam Lithography, Measurement +21

EUV source-mask optimization for 7nm node and beyond

Xiaofeng Liu, Rafael C. Howell, Stephen D. H. Hsu et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 28 citations