Steve Hansen

EUV simulation extension study for mask shadowing effect and its correction

Hoyoung Kang, Steve Hansen, Jan van Schoot et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 44 citations

Computing, Electrical Engineering, Computational Electromagnetics +11

EUV resolution enhancement techniques (RETs) for k₁0.4 and below

Stephen D. H. Hsu, Rafael C. Howell, Jianjun Jia et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 27 citations

Engineering, Computer Engineering, Electrical Engineering +15

X-ray spectroscopy with elliptical crystals and face-on framing cameras

R. F. Heeter, J. Emig, K. B. Fournier et al. · Review of Scientific Instruments · 2004 · 18 citations · Full text

Natural Sciences, Physics, Optics +14

Optical lithography in the sub-50-nm regime

Donis G. Flagello, Steve Hansen, Mircea Dusa et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 10 citations · Full text

Natural Sciences, Materials Science, Optical Materials +10

Enabling the 45nm node by hyper-NA polarized lithography

Wim de Boeij, G. H. P. M. Swinkels, Nicolas le Masson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 10 citations

Engineering, Materials Engineering, Optical Materials +12