Jan B. van Schoot

Mask error factor: causes and implications for process latitude

Jan B. van Schoot, Jo Finders, Koen van Ingen Schenau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 28 citations

Engineering, Electron-beam Lithography, Measurement +21

Performance of a step-and-scan system for DUV lithography

Gerard de Zwart, Martin A. van den Brink, Richard A. George et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 23 citations

Engineering, Electron-beam Lithography, Optic Design +19

Optimizing and enhancing optical systems to meet the low k 1 challenge

Donis G. Flagello, Robert Socha, Xuelong Shi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 22 citations

Optical Materials, Engineering, Microscopy +30

CD uniformity improvement by active scanner corrections

Jan B. van Schoot, O.F.J. Noordman, Peter Vanoppen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2002 · 22 citations

Engineering, Electron-beam Lithography, Measurement +24

Understanding systematic and random CD variations using predictive modeling techniques

Donis G. Flagello, Hans van der Laan, Jan B. van Schoot et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 22 citations

Engineering, Optic Design, Rare Event Estimation +24