Alessandro Vaglio Pret

Impact of stochastic effects on EUV printability limits

Peter De Bisschop, Jeroen Van de Kerkhove, Julien Mailfert et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 42 citations

Reliability, Reliability Engineering, Engineering +14

Modeling and simulation of low-energy electron scattering in organic and inorganic EUV photoresists

Alessandro Vaglio Pret, Trey Graves, David Blankenship et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 26 citations

Engineering, Electron-beam Lithography, Alternative Photoresist Platforms +24

Opportunities and challenges in device scaling by the introduction of EUV lithography

Kurt Ronse, Peter De Bisschop, Geert Vandenberghe et al. · 2012 · 23 citations

Engineering, Vlsi Design, Electron-beam Lithography +23

Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for extreme ultraviolet lithography

Alessandro Vaglio Pret · Journal of Micro/Nanolithography MEMS and MOEMS · 2010 · 22 citations

Rinse Postlithography, Engineering, Electron-beam Lithography +18

Quantification of shot noise contributions to contact hole local CD nonuniformity

Roel Gronheid, Gustaf Winroth, Alessandro Vaglio Pret et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 19 citations