Geert Vandenberghe

Implementation of templated DSA for via layer patterning at the 7nm node

Roel Gronheid, Jan Doise, Joost Bekaert et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 114 citations

Engineering, Mechanical Engineering, Computer Architecture +20

Integrated fab process for metal oxide EUV photoresist

Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 80 citations

Photoresists in extreme ultraviolet lithography (EUVL)

Danilo De Simone, Yannick Vesters, Geert Vandenberghe · Advanced Optical Technologies · 2017 · 45 citations

Materials Science, Optical Materials, Extreme Ultraviolet Lithography +15

Metal oxide EUV photoresist performance for N7 relevant patterns and processes

Jason K. Stowers, Jeremy T. Anderson, Brian Cardineau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 41 citations

Optical Materials, Engineering, Electron-beam Lithography +19

Application challenges with double patterning technology (DPT) beyond 45 nm

Jungchul Park, Stephen Hsu, Douglas Van Den Broeke et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 38 citations

Engineering, Electron-beam Lithography, Pattern Transfer +26