Benjamin L. Clark

Low-Temperature Thin-Film Deposition and Crystallization

Sangmoon Park, Benjamin L. Clark, Douglas A. Keszler et al. · Science · 2002 · 99 citations

Materials Science, Optical Materials, Engineering +15

Integrated fab process for metal oxide EUV photoresist

Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 80 citations

Directly patterned inorganic hardmask for EUV lithography

Jason K. Stowers, Alan Telecky, Michael Kocsis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 64 citations

Materials Science, Materials Engineering, Resist Film Thickness +15

Zn2GeO4:Mn alternating-current thin-film electroluminescent devices

Jeffrey P. Bender, John F. Wager, Judith L. Kissick et al. · Journal of Luminescence · 2002 · 57 citations

Engineering, Oxide Electronics, Applied Physics +2

Metal oxide EUV photoresist performance for N7 relevant patterns and processes

Jason K. Stowers, Jeremy T. Anderson, Brian Cardineau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 41 citations

Optical Materials, Engineering, Electron-beam Lithography +19