Integrated fab process for metal oxide EUV photoresist

Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark, +10

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

Roberto Fallica, Jason K. Stowers, Andrew Grenville, +3

Journal of Micro/Nanolithography MEMS and MOEMS

Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyAbsorption Spectroscopy +17

Competitive device performance of low-temperature and all-solution-processed metal-oxide thin-film transistors

Kyung Min Kim, Chi Wan Kim, Jaeseok Heo, +10

Applied Physics Letters

Materials ScienceElectrical EngineeringElectronic DevicesEngineeringSemiconductor Device +13

Directly patterned inorganic hardmask for EUV lithography

Jason K. Stowers, Alan Telecky, Michael Kocsis, +5

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Materials ScienceMaterials EngineeringResist Film ThicknessEngineeringElectron-beam Lithography +13

Liquid immersion lithography: Why, how, and when?

M. Rothschild, T. M. Bloomstein, Roderick R. Kunz, +6

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Materials ScienceOptical MaterialsEngineeringElectron-beam LithographyBeam Lithography +12

Metal oxide EUV photoresist performance for N7 relevant patterns and processes

Jason K. Stowers, Jeremy T. Anderson, Brian Cardineau, +12

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringElectron-beam LithographyMicroscopyVacuum Device +17

Excimer-laser-induced degradation of fused silica and calcium fluoride for 193-nm lithographic applications

Vladimir Liberman, M. Rothschild, Jan Sedláček, +4

Optics Letters

Materials SciencePhotonicsMarathon Irradiation ChamberAdvanced Laser ProcessingEngineering +11

Dynamic absorption coefficients of CAR and non-CAR resists at EUV

Roberto Fallica, Jason K. Stowers, Andrew Grenville, +3

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Electrical EngineeringEngineeringResistorPhysicsPhotochemistry +12

Photopatternable inorganic hardmask

Alan Telecky, Peng Xie, Jason K. Stowers, +3

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

Optical MaterialsEngineeringElectron-beam LithographyOptoelectronic DevicesPhotopatternable Inorganic Hardmask +19

Excimer-laser-induced densification of fused silica:laser-fluence and material-grade effects on the scaling law

Vladimir Liberman, M. Rothschild, Jan Sedláček, +2

Journal of Non-Crystalline Solids

Materials SciencePhotonicsEngineeringPhysicsOptical Properties +10