Andrew Grenville

Integrated fab process for metal oxide EUV photoresist

Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 80 citations

Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

Roberto Fallica, Jason K. Stowers, Andrew Grenville et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2016 · 78 citations · Full text

Short Wavelength Optic, Optical Materials, Engineering +19

Competitive device performance of low-temperature and all-solution-processed metal-oxide thin-film transistors

Kyung Min Kim, Chi Wan Kim, Jaeseok Heo et al. · Applied Physics Letters · 2011 · 74 citations

Materials Science, Electrical Engineering, Electronic Devices +15

Directly patterned inorganic hardmask for EUV lithography

Jason K. Stowers, Alan Telecky, Michael Kocsis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 64 citations

Materials Science, Materials Engineering, Resist Film Thickness +15

Liquid immersion lithography: Why, how, and when?

M. Rothschild, T. M. Bloomstein, Roderick R. Kunz et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 49 citations

Materials Science, Optical Materials, Engineering +14