Jason K. Stowers

High resolution, high sensitivity inorganic resists

Jason K. Stowers, Douglas A. Keszler · Microelectronic Engineering · 2008 · 96 citations

Inorganic Chemistry, High Resolution, Engineering +6

Integrated fab process for metal oxide EUV photoresist

Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 80 citations

Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet

Roberto Fallica, Jason K. Stowers, Andrew Grenville et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2016 · 78 citations · Full text

Short Wavelength Optic, Optical Materials, Engineering +19

Directly patterned inorganic hardmask for EUV lithography

Jason K. Stowers, Alan Telecky, Michael Kocsis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 64 citations

Materials Science, Materials Engineering, Resist Film Thickness +15

Low-temperature, solution processing of TiO2 thin films and fabrication of multilayer dielectric optical elements

Kai Jiang, Andriy Zakutayev, Jason K. Stowers et al. · Solid State Sciences · 2009 · 55 citations

Materials Science, Optical Materials, Engineering +10