Alan Telecky

Integrated fab process for metal oxide EUV photoresist

Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 80 citations

Directly patterned inorganic hardmask for EUV lithography

Jason K. Stowers, Alan Telecky, Michael Kocsis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 64 citations

Materials Science, Materials Engineering, Resist Film Thickness +15

Metal oxide EUV photoresist performance for N7 relevant patterns and processes

Jason K. Stowers, Jeremy T. Anderson, Brian Cardineau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 41 citations

Optical Materials, Engineering, Electron-beam Lithography +19

Photopatternable inorganic hardmask

Alan Telecky, Peng Xie, Jason K. Stowers et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2010 · 29 citations

Optical Materials, Engineering, Electron-beam Lithography +21

<i>In‐situ</i> characterization of aqueous‐based hafnium oxide hydroxide sulfate thin films

Brendan T. Flynn, Daeho Kim, Benjamin L. Clark et al. · Surface and Interface Analysis · 2013 · 12 citations

Engineering, Thin Film Process Technology, Chemistry +16