Jan Doise

Implementation of templated DSA for via layer patterning at the 7nm node

Roel Gronheid, Jan Doise, Joost Bekaert et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 114 citations

Engineering, Mechanical Engineering, Computer Architecture +20

Sub‐5 nm Patterning by Directed Self‐Assembly of Oligo(Dimethylsiloxane) Liquid Crystal Thin Films

Koen Nickmans, Jeffrey N. Murphy, Bas de Waal et al. · Advanced Materials · 2016 · 68 citations · Full text

Engineering, Molecular Self-assembly, Liquid Crystalline Elastomer +20

28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV lithography

Danilo De Simone, Luka Ključar, Poulomi Das et al. · 2021 · 25 citations

Process optimization of templated DSA flows

Roel Gronheid, Joost Bekaert, Vijaya-Kumar Murugesan Kuppuswamy et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 19 citations

Numerical Analysis, Mathematical Programming, Engineering +23

Strategies for Increasing the Rate of Defect Annihilation in the Directed Self-Assembly of High-χ Block Copolymers

Jan Doise, Jai Hyun Koh, Ji Yeon Kim et al. · ACS Applied Materials & Interfaces · 2019 · 18 citations