Luka Ključar

Capacitor-less, Long-Retention (>400s) DRAM Cell Paving the Way towards Low-Power and High-Density Monolithic 3D DRAM

Attilio Belmonte, Hyungrock Oh, Nouredine Rassoul et al. · 2020 · 177 citations

Electrical Engineering, Engineering, Transistor Layout Parameters +15

28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV lithography

Danilo De Simone, Luka Ključar, Poulomi Das et al. · 2021 · 25 citations

Oxygen Defect Stability in Amorphous, <i>C</i>-Axis Aligned, and Spinel IGZO

Michiel J. van Setten, H.F.W. Dekkers, Luka Ključar et al. · ACS Applied Electronic Materials · 2021 · 25 citations

Engineering, Solid-state Chemistry, Oxygen Defect Stability +17

Impact of Via Density on the Mechanical Integrity of Advanced Back-End-of-Line During Packaging

Luka Ključar, Mario González, Kristof Croes et al. · 2016 · 15 citations

Engineering, Mechanical Engineering, Chip Package Interaction +17

Mechanical stability of Cu/low-k BEOL interconnects

Mario González, Kris Vanstreels, Vladimir Cherman et al. · 2014 · 14 citations

Engineering, Mechanical Stability, Mechanical Engineering +19