Integrated fab process for metal oxide EUV photoresist

Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark, +10

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Photoresists in extreme ultraviolet lithography (EUVL)

Danilo De Simone, Yannick Vesters, Geert Vandenberghe

Advanced Optical Technologies

Materials ScienceOptical MaterialsExtreme Ultraviolet LithographyEngineeringPhotochemistry +13

Metal oxide EUV photoresist performance for N7 relevant patterns and processes

Jason K. Stowers, Jeremy T. Anderson, Brian Cardineau, +12

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Optical MaterialsEngineeringElectron-beam LithographyMicroscopyVacuum Device +17

Effect of molecular weight on the EUV-printability of main chain scission type polymers

Ashish Rathore, Ivan Pollentier, Harpreet Singh, +3

Journal of Materials Chemistry C

EngineeringMechanical EngineeringResponsive PolymersChemistryPolymers +16

Metal-containing Materials as Turning Point of EUV Lithography

Danilo De Simone, Ivan Pollentier, Geert Vandenberghe

Journal of Photopolymer Science and Technology

EngineeringElectron-beam LithographyDevice IntegrationTarget FabricationBeam Lithography +14

Photo Material Readiness at the Eve of EUVL HVM

Danilo De Simone, Pieter Vanelderen, Geert Vandenberghe

Journal of Photopolymer Science and Technology

Optical MaterialsEngineeringElectron-beam LithographyBeam LithographyOptical Properties +14

28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV lithography

Danilo De Simone, Luka Ključar, Poulomi Das, +26

Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems

Ashish Rathore, Ivan Pollentier, Maicol Cipriani, +4

ACS Applied Polymer Materials

Mechanistic StudiesEngineeringElectron-beam LithographyChemistryChemical Engineering +18

Polymer−Surfactant Interactions. A Quantitative Approach to the Enthalpy of Transfer of Poly(Ethylene Glycol)s from Water to the Aqueous Sodium Perfluoroalkanoates Solutions

R. De Lisi, Danilo De Simone, Stefana Milioto

The Journal of Physical Chemistry B

Extreme Ultraviolet Lithographic Performance and Reaction Mechanism of Polymeric Resist─Utilizing Radical- and Acid-Amplified Cross-Linking

Bilal Abbas Naqvi, Satoshi Enomoto, Kohei Machida, +5

Chemistry of Materials

Optical MaterialsAcid Amplification ReactionEngineeringElectron-beam LithographyPolymer Chain +23