Danilo De Simone

Integrated fab process for metal oxide EUV photoresist

Andrew Grenville, Jeremy T. Anderson, Benjamin L. Clark et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 80 citations

Photoresists in extreme ultraviolet lithography (EUVL)

Danilo De Simone, Yannick Vesters, Geert Vandenberghe · Advanced Optical Technologies · 2017 · 45 citations

Materials Science, Optical Materials, Extreme Ultraviolet Lithography +15

Metal oxide EUV photoresist performance for N7 relevant patterns and processes

Jason K. Stowers, Jeremy T. Anderson, Brian Cardineau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 41 citations

Optical Materials, Engineering, Electron-beam Lithography +19

Effect of molecular weight on the EUV-printability of main chain scission type polymers

Ashish Rathore, Ivan Pollentier, Harpreet Singh et al. · Journal of Materials Chemistry C · 2020 · 36 citations · Full text

Engineering, Mechanical Engineering, Responsive Polymers +18

Metal-containing Materials as Turning Point of EUV Lithography

Danilo De Simone, Ivan Pollentier, Geert Vandenberghe · Journal of Photopolymer Science and Technology · 2015 · 25 citations · Full text

Engineering, Electron-beam Lithography, Device Integration +16