Extreme Ultraviolet Lithography is a photolithographic patterning method that uses extreme ultraviolet light at a wavelength of approximately 13.5 nanometers to enable sub-micron feature resolution in thin-film fabrication by selectively exposing photosensitive materials through reflective optical systems.
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47.8K
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4.4K
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Publications per year
2017–2026
256
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Euv LithographyEuvl
Publications
1.4K
<i>AGTR2</i> Mutations in X-Linked Mental Retardation
Virginie Vervoort, Michael A. Beachem, Penny S. Edwards et al. · Science · 2002 · 719 citations
Generation of Spatially Coherent Light at Extreme Ultraviolet Wavelengths
Randy A. Bartels, Ariel Paul, Hans Green et al. · Science · 2002 · 406 citations · Full text
Natural Sciences, Physics, Optics +16
Jannick P. Rolland, Matthew A. Davies, Thomas J. Suleski et al. · Optica · 2021 · 387 citations · Full text
Extreme Ultraviolet Lithography
Jeffrey Bokor · 1997 · 256 citations
Engineering, Electrical Engineering, Manufacturing Engineering +13
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Authors
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- TK
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- PNPatrick Naulleau
Lawrence Berkeley National Laboratory, United States
54 publications · 1.3K citations
21
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1–5 of 4.4K
Institutions
694
Paul Scherrer Institute
Villigen, Switzerland
35 h-index
305 publications
12.5K citations
The University of Osaka
Osaka, Japan
32 h-index
272 publications
11.8K citations
Lawrence Berkeley National Laboratory
Berkeley, United States
28 h-index
343 publications
9.5K citations
Intel (United States)
Santa Clara, United States
28 h-index
227 publications
6.3K citations
ASML (Netherlands)
Veldhoven, The Netherlands
28 h-index
257 publications
7.8K citations
Lawrence Livermore National Laboratory
Livermore, United States
25 h-index
218 publications
7K citations
IMEC
Leuven, Belgium
21 h-index
225 publications
5.1K citations
Osaka Research Institute of Industrial Science and Technology
Osaka, Japan
19 h-index
52 publications
1.6K citations
1–8 of 694
Venues
- Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
130 publications · 4.3K citations
37
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- Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
296 publications · 5.9K citations
32
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- Microelectronic Engineering
76 publications · 3K citations
31
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- Japanese Journal of Applied Physics
JJAP · 88 publications · 2.9K citations
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- Journal of Micro/Nanolithography MEMS and MOEMS
77 publications · 2.2K citations
27
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