Concepedia

Patrick Naulleau

PN

Statistics

Publications

127

Citations

3.1K

H-Index

30

Active since

1995

Affiliations

Lawrence Berkeley National Laboratory(Current)

University of California, Berkeley

Lawrence Livermore National Laboratory

Intel (United States)

University at Albany, State University of New York

Patrick Naulleau is an author at Lawrence Berkeley National Laboratory specializing in engineering, applied physics, and optical properties.

Top concepts

EngineeringApplied PhysicsOptical PropertiesInstrumentationOptoelectronicsMicroscopyPhysicsPhotonicsOphthalmologyMicrofabrication

Publications per year

1995–2022

127

Publications

127

Biological soft X-ray tomography on beamline 2.1 at the Advanced Light Source

Mark A. Le Gros, Gerry McDermott, Bertrand Cinquin et al. · Journal of Synchrotron Radiation · 2014 · 95 citations · Full text

X-ray Tomography, Engineering, Microscopy +17

Hartmann wave-front measurement at 134 nm with λ_EUV/120 accuracy

Pascal Mercère, Philippe Zeitoun, Mourad Idir et al. · Optics Letters · 2003 · 92 citations

Extreme-ultraviolet phase-shifting point-diffraction interferometer: a wave-front metrology tool with subangstrom reference-wave accuracy

Patrick Naulleau, Kenneth A. Goldberg, Sang H. Lee et al. · Applied Optics · 1999 · 91 citations

Engineering, Optical Testing, Interferometry +18

Resist Materials for Extreme Ultraviolet Lithography: Toward Low‐Cost Single‐Digit‐Nanometer Patterning

Paul D. Ashby, Deirdre L. Olynick, D. Frank Ogletree et al. · Advanced Materials · 2015 · 69 citations

Directly patterned inorganic hardmask for EUV lithography

Jason K. Stowers, Alan Telecky, Michael Kocsis et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 64 citations

Materials Science, Materials Engineering, Resist Film Thickness +15

1–5 of 127