Toshiro Itani

Resist Materials and Processes for Extreme Ultraviolet Lithography

Toshiro Itani, Takahiro Kozawa · Japanese Journal of Applied Physics · 2012 · 182 citations · Full text

Materials Science, Materials Engineering, Electrical Engineering +15

Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani et al. · Applied Physics Express · 2010 · 106 citations

Materials Science, Surface Characterization, Chemical Gradient +15

Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani et al. · Japanese Journal of Applied Physics · 2010 · 98 citations

Engineering, Electron-beam Lithography, Microscopy +20

Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani et al. · Japanese Journal of Applied Physics · 2010 · 92 citations

Engineering, Electron-beam Lithography, Microscopy +19

A 2.5-ns clock access, 250-MHz, 256-Mb SDRAM with synchronous mirror delay

T. Saeki, Y. Nakaoka, Masafumi Fujita et al. · IEEE Journal of Solid-State Circuits · 1996 · 87 citations

System On Chip, 256-Mb Sdram, Vlsi Design +15