Hiroaki Oizumi

Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist

Takahiro Kozawa, Seiichi Tagawa, Hiroaki Oizumi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2006 · 125 citations

Natural Sciences, Materials Engineering, Materials Science +13

Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani et al. · Applied Physics Express · 2010 · 106 citations

Natural Sciences, Chemistry, Materials Science +13

Resist Parameter Extraction from Line-and-Space Patterns of Chemically Amplified Resist for Extreme Ultraviolet Lithography

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani et al. · Japanese Journal of Applied Physics · 2010 · 98 citations

Engineering, Electrical Engineering, Materials Science +13

Reconstruction of Latent Images from Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Resist for Extreme Ultraviolet Lithography

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani et al. · Japanese Journal of Applied Physics · 2010 · 92 citations

Engineering, Materials Engineering, Materials Science +13

Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist

Takahiro Kozawa, Hiroaki Oizumi, Toshiro Itani et al. · Japanese Journal of Applied Physics · 2011 · 73 citations

Natural Sciences, Materials Engineering, Materials Science +15