Publication | Open Access
Sub‐5 nm Patterning by Directed Self‐Assembly of Oligo(Dimethylsiloxane) Liquid Crystal Thin Films
68
Citations
42
References
2016
Year
EngineeringMolecular Self-assemblyLiquid Crystalline ElastomerColloidal NanocrystalsThin Film Process TechnologyChemistryDirected Self‐assemblyNanolithography MethodThin Film ProcessingMaterials ScienceNanotechnologyMolecular EngineeringNanomaterialsNatural SciencesSelf-assemblyApplied PhysicsUltrasmall Feature SizesNanofabricationOrdered DomainsThin FilmsLiquid CrystalsNanoarchitectonicsOrganic-inorganic Hybrid Material
Highly ordered nanopatterns are obtained at sub-5 nm periodicities by the graphoepitaxial directed self-assembly of monodisperse, oligo(dimethylsiloxane) liquid crystals. These hybrid organic/inorganic liquid crystals are of high interest for nanopatterning applications due to the combination of their ultrasmall feature sizes and their ability to be directed into highly ordered domains without additional annealing.
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