Chris A. Mack - Concepedia

Author

Chris A. Mack

Also Known As

C. A. Mack, C. Mack, C.A. Mack, CHRIS A. MACK, Carla Mack, Chris A Mack, Chris A. Mack, Chris A. Mack Chris A. Mack, Chris Mack, James W. Thackeray

435

Publications

5.1K

Citations

H-Index

179

Concepts

All Affiliations

KLA (United States)IMEC United States Department of Defense The University of Texas at Austin

About

Chris A. Mack is an author at KLA (United States) specializing in engineering, applied physics, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	26	87	2.9K
2	Education	7	7	147
3	Health Sciences	6	6	118
4	Law	2	2	694
5	Humanities	1	1	33

Chris A. Mack

Publications

3.1K

Citations

H-Index

Page 1

	Year	Citations
Fifty Years of Moore's Law Chris A. Mack IEEE Transactions on Semiconductor Manufacturing EngineeringVlsi DesignComputer ArchitectureLawIntegrated Circuits	2011	612
Development of Positive Photoresists Chris A. Mack Journal of The Electrochemical Society PhotonicsSurface InductionOptical MaterialsEngineeringPhotoreceptor Cell	1987	153
PROLITH: A Comprehensive Optical Lithography Model Chris A. Mack Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringDiffraction ModelElectron-beam LithographyBeam Lithography	1985	123
Investigation of microstructured milling tool for deferring tool wear Wenlong Chang, Jining Sun, Xichun Luo, Wear Materials ScienceMicrostructured Milling ToolEngineeringMaterial MachiningTool Wear	2011	112
Generating random rough edges, surfaces, and volumes Chris A. Mack Applied Optics EngineeringGeometry GenerationComputer-aided DesignComputational MechanicsCorrelation Length	2013	92
The Multiple Lives of Moore's Law Chris A. Mack IEEE Spectrum Gordon E. MooreHalf Century AgoEngineeringMultiple LivesYoung Engineer	2015	82
Analytical expression for the standing wave intensity in photoresist Chris A. Mack Applied Optics PhotonicsEngineeringPhysicsWave OpticOptical Properties	1986	59
Systematic errors in the measurement of power spectral density Chris A. Mack Journal of Micro/Nanolithography MEMS and MOEMS Systematic BiasesEngineeringPhysicsMeasurementCalibration	2013	57
Reducing roughness in extreme ultraviolet lithography Chris A. Mack Journal of Micro/Nanolithography MEMS and MOEMS Materials ScienceElectrical EngineeringEngineeringExtreme Ultraviolet LithographyElectron-beam Lithography	2018	52
Absorption and exposure in positive photoresist Chris A. Mack Applied Optics Ultraviolet LightEngineeringOphthalmologyPhotochemistryOptical Properties	1988	51

Page 1