Liping Ren

Line width roughness control and pattern collapse solutions for EUV patterning

Karen Petrillo, George Huang, Dominic Ashworth et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 19 citations

Characterization of promising resist platforms for sub-30-nm HP manufacturability and EUV CAR extendibility study

Chawon Koh, Jacque H. Georger, Liping Ren et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 18 citations

Engineering, Electron-beam Lithography, Resist Collapse +19

Assessment of EUV resist readiness for 32-nm hp manufacturing and extendibility study of EUV ADT using state-of-the-art resist

Chawon Koh, Liping Ren, Jacque H. Georger et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 15 citations

Short Wavelength Optic, Engineering, Electron-beam Lithography +17

A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection

Sungmin Huh, Liping Ren, David Y. Chan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 14 citations

Wafer Scale Processing, Extreme Ultraviolet Lithography, Mask Inspection +10