Chawon Koh

Multinuclear Tin-Based Macrocyclic Organometallic Resist for EUV Photolithography

Ga‐Young Lim, Kangsik Lee, Chawon Koh et al. · ACS Materials Au · 2024 · 32 citations · Full text

22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

Patrick Naulleau, Christopher N. Anderson, Jerrin Chiu et al. · Microelectronic Engineering · 2009 · 31 citations

Ultraviolet Light, Photonics, Engineering +11

Characterization of promising resist platforms for sub-30-nm HP manufacturability and EUV CAR extendibility study

Chawon Koh, Jacque H. Georger, Liping Ren et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 18 citations

Engineering, Electron-beam Lithography, Resist Collapse +19

Assessment of EUV resist readiness for 32-nm hp manufacturing and extendibility study of EUV ADT using state-of-the-art resist

Chawon Koh, Liping Ren, Jacque H. Georger et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 15 citations

Short Wavelength Optic, Engineering, Electron-beam Lithography +17

Limitation of blend type of resist platform on EUV lithography

Taku Hirayama, Su Min Kim, Hai Sub Na et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 13 citations

Engineering, Electron-beam Lithography, Chemical Engineering +17