Chawon Koh - Concepedia

Author

Chawon Koh

Samsung (South Korea)

Also Known As

C.M. Koh, Cha-Won Koh, Chawon Koh, Jiyoul Lee

Publications

242

Citations

H-Index

Concepts

All Affiliations

Samsung (South Korea)Lawrence Berkeley National Laboratory Advanced Micro Devices (United States)Intel (United States)Yonsei University

About

Chawon Koh is an author at Samsung (South Korea) specializing in engineering, electronic packaging, and microelectronics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	5	5	90
2	Applied Physics	4	4	77
3	Electrical Engineering	2	2	33
4	Materials Engineering	2	2	31
5	Chemical Engineering	1	1	13

Chawon Koh

Publications

133

Citations

H-Index

Page 1

	Year	Citations
Multinuclear Tin-Based Macrocyclic Organometallic Resist for EUV Photolithography Ga‐Young Lim, Kangsik Lee, Chawon Koh, ACS Materials Au	2024	32
22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool Patrick Naulleau, Christopher N. Anderson, Jerrin Chiu, Microelectronic Engineering Ultraviolet LightPhotonicsEngineeringElectron-beam LithographyPhysics	2009	31
Characterization of promising resist platforms for sub-30-nm HP manufacturability and EUV CAR extendibility study Chawon Koh, Jacque H. Georger, Liping Ren, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyResist CollapseResistorBeam Lithography	2010	18
Assessment of EUV resist readiness for 32-nm hp manufacturing and extendibility study of EUV ADT using state-of-the-art resist Chawon Koh, Liping Ren, Jacque H. Georger, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Short Wavelength OpticEngineeringElectron-beam LithographyNm Hp PatterningIntegrated Circuits	2009	15
Limitation of blend type of resist platform on EUV lithography Taku Hirayama, Su Min Kim, Hai Sub Na, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyChemical EngineeringResistorBeam Lithography	2012	13
Printability and inspectability of programmed pit defects on the masks in EUV lithography In-Yong Kang, Hwan-Seok Seo, Byung-Sup Ahn, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyEuv LithographyMechanical EngineeringWafer Scale Processing	2010	13
Layer-Ordered Organooxotin Clusters for Extreme-Ultraviolet Photolithography Sihyun Woo, Ji Hye Baek, Chawon Koh, ACS Applied Materials & Interfaces	2024	11

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