Publication | Closed Access
22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool
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Citations
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References
2009
Year
Ultraviolet LightPhotonicsEngineeringElectron-beam LithographyPhysicsMicroscopyOptical PropertiesSematech BerkeleyBeam LithographyApplied PhysicsExposure ToolSynchrotron RadiationOptical EngineeringUv-vis Spectroscopy
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