22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

<title>Recent developments in EUV reflectometry at the Advanced Light Source</title>

Eric M. Gullikson, Stanley Mrowka, B. Kaufmann · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 100 citations

Natural Sciences, Materials Engineering, Materials Science +15

First performance results of the ASML alpha demo tool

H. Meiling, H.C. Meijer, Vadim Banine et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 78 citations

Engineering, Electrical Engineering, Microfabrication +5

Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

Patrick Naulleau, Kenneth A. Goldberg, Phil Batson et al. · Applied Optics · 2003 · 45 citations

Natural Sciences, Manufacturing Engineering, Microfabrication +13

System-level line-edge roughness limits in extreme ultraviolet lithography

Patrick Naulleau, Dimitra Niakoula, Guojing Zhang · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 39 citations

Engineering, Manufacturing Engineering, Microfabrication +16

High-resolution EUV imaging tools for resist exposure and aerial image monitoring

Martin J. Booth, O. Brisco, Adam N. Brunton et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 37 citations

Engineering, Mechanical Engineering, Digital Imaging +9