Russ Hudyma

22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool

Patrick Naulleau, Christopher N. Anderson, Jerrin Chiu et al. · Microelectronic Engineering · 2009 · 31 citations

Natural Sciences, Electrical Engineering, Materials Science +7

Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

Holger Glatzel, Dominic Ashworth, Mark Bremer et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 26 citations

Engineering, Materials Engineering, Microfabrication +10

Projection optics for EUVL micro-field exposure tools with 0.5 NA

Holger Glatzel, Dominic Ashworth, Dan Bajuk et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 21 citations

Natural Sciences, Physics, Metrology +10

Extreme-ultraviolet microexposure tool at 05 NA for sub-16 nm lithography

Michael Goldstein, Russ Hudyma, Patrick Naulleau et al. · Optics Letters · 2008 · 18 citations

Engineering, Electrical Engineering, Materials Science +12