Holger Glatzel

Projection optics for extreme ultraviolet lithography (EUVL) micro-field exposure tools (METs) with a numerical aperture of 0.5

Holger Glatzel, Dominic Ashworth, Mark Bremer et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 26 citations

Engineering, Materials Engineering, Microfabrication +10

Projection optics for EUVL micro-field exposure tools with 0.5 NA

Holger Glatzel, Dominic Ashworth, Dan Bajuk et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 21 citations

Natural Sciences, Physics, Metrology +10

JWST mirror production status

Benjamin Gallagher, Mark Bergeland, Bob Brown et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 12 citations

Engineering, Aerospace Engineering, Manufacturing Engineering +13