Paul Denham

Calibration and standards beamline 6.3.2 at the Advanced Light Source

J. H. Underwood, Eric M. Gullikson, Masato Koike et al. · Review of Scientific Instruments · 1996 · 78 citations

Engineering, Physics, Metrology +13

Critical challenges for EUV resist materials

Patrick Naulleau, Christopher N. Anderson, Lorie-Mae Baclea-an et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 63 citations

Engineering, Electrical Engineering, Materials Science +13

Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

Patrick Naulleau, Kenneth A. Goldberg, Phil Batson et al. · Applied Optics · 2003 · 45 citations

Natural Sciences, Manufacturing Engineering, Microfabrication +13

Hidden planetary friends: on the stability of two-planet systems in the presence of a distant, inclined companion

Paul Denham, Smadar Naoz, Bao-Minh Hoang et al. · Monthly Notices of the Royal Astronomical Society · 2018 · 42 citations · Full text

Natural Sciences, Astronomy, Physics +17

At-wavelength interferometry for extreme ultraviolet lithography

Edita Tejnil, Kenneth A. Goldberg, Sang-Hun Lee et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1997 · 39 citations

Natural Sciences, Materials Science, Optical Materials +16