Concepedia
Statistics
Publications
5
Citations
93
H-Index
Active since
2001
Affiliations
Lawrence Berkeley National Laboratory(Current)
Industrial Technology Research Institute
National Taipei University of Technology
MIT Lincoln Laboratory
Photronics (United States)
David Y. Chan is an author at Lawrence Berkeley National Laboratory specializing in engineering, microelectronics, and microfabrication.
Top concepts
EngineeringMicroelectronicsMicrofabricationMicroscopyApplied PhysicsOptoelectronicsEnergy EfficiencyComputational ImagingComputational Optical ImagingHealth
Publications per year
2001–2010
Capturing energy-saving opportunities in make-up air systems for cleanrooms of high-technology fabrication plant in subtropical climate
Jhy-Ming Tsao, Shih-Cheng Hu, Tengfang Xu et al. · Energy and Buildings · 2010 · 40 citations
Engineering, Energy Efficiency, Air Quality +17
Characterization of energy use in 300 mm DRAM (Dynamic Random Access Memory) wafer fabrication plants (fabs) in Taiwan
Shih-Cheng Hu, Tengfang Xu, Tony Chaung et al. · Energy · 2010 · 17 citations
Non-volatile Memory, Electrical Engineering, Mm Dram +9
A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection
Sungmin Huh, Liping Ren, David Y. Chan et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 14 citations
Wafer Scale Processing, Extreme Ultraviolet Lithography, Mask Inspection +10
100-nm node lithography with KrF?
M. Fritze, Brian Tyrrell, David K. Astolfi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2001 · 11 citations
High Resolution, Engineering, Electron-beam Lithography +25
Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography
M. Fritze, Brian Tyrrell, David K. Astolfi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2001 · 11 citations
Engineering, Electron-beam Lithography, Microscopy +20
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