Alden Acheta

The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness

Timothy B. Michaelson, Adam R. Pawloski, Alden Acheta et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 71 citations

Chemical Gradients, Engineering, Electron-beam Lithography +16

Characterization of line-edge roughness in photoresist using an image fading technique

Adam R. Pawloski, Alden Acheta, Ivan Lalovic et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 57 citations

The transfer of photoresist LER through etch

Adam R. Pawloski, Alden Acheta, Scott Bell et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 29 citations

Polysilicon Ler, Electrical Engineering, Polysilicon Gate +9

Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer

Thomas I. Wallow, Alden Acheta, Yuansheng Ma et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 28 citations

Engineering, Electron-beam Lithography, Photoresist Ler +16

Understanding the role of base quenchers in photoresists

Timothy B. Michaelson, Andrew Jamieson, Adam R. Pawloski et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 19 citations

Engineering, Electron-beam Lithography, Chemical Composition +16