Alden Acheta - Concepedia

Author

Alden Acheta

Advanced Micro Devices (United States)

Also Known As

A. Acheta, Alden Acheta

Publications

292

Citations

H-Index

Concepts

All Affiliations

Advanced Micro Devices (United States)ASML (Netherlands)The University of Texas at Austin ASML (United States)

About

Alden Acheta is an author at Advanced Micro Devices (United States) specializing in engineering, microelectronics, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	199
2	Applied Physics	6	6	155
3	Health Sciences	3	3	63
4	Education	1	1	13
5	Medicine	1	1	10

Alden Acheta

Publications

256

Citations

H-Index

Page 1

	Year	Citations
The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness Timothy B. Michaelson, Adam R. Pawloski, Alden Acheta, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Chemical GradientsEngineeringElectron-beam LithographyPhotoresist LerPhotoresist Film	2005	71
Characterization of line-edge roughness in photoresist using an image fading technique Adam R. Pawloski, Alden Acheta, Ivan Lalovic, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2004	57
The transfer of photoresist LER through etch Adam R. Pawloski, Alden Acheta, Scott Bell, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Polysilicon LerElectrical EngineeringPolysilicon GateEngineeringPhotochemistry	2006	29
Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer Thomas I. Wallow, Alden Acheta, Yuansheng Ma, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyPhotoresist LerLine-edge RoughnessBeam Lithography	2007	28
Understanding the role of base quenchers in photoresists Timothy B. Michaelson, Andrew Jamieson, Adam R. Pawloski, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyChemical CompositionIntegrated CircuitsBeam Lithography	2004	19
Flare and its impact on low-k 1 KrF and ArF lithography Bruno M. La Fontaine, Mircea Dusa, Alden Acheta, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyOptical TestingOptical MetrologyCalculated Mtf	2002	15
A lithographic and process assessment of photoresist stabilization for double-patterning using 172-nm photoresist curing Nikolaos Bekiaris, Hiram Cervera, Jun Yan Dai, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMicroscopyPattern TransferBeam Lithography	2008	14
Evaluating diffraction based overlay metrology for double patterning technologies Chandra Saru Saravanan, Yongdong Liu, Prasad Dasari, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Optical MaterialsEngineeringElectron-beam LithographyMeasurementOverlay Measurements	2008	13
Study of the influence of substrate topography on the focusing performance of advanced lithography scanners Bruno M. La Fontaine, Jan Hauschild, Mircea Dusa, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyMicroscopyAdvanced Lithography ScannersPhase-grating Focus Monitor	2003	10

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