Yuansheng Ma - Concepedia

Author

Yuansheng Ma

Mentor Technologies

Also Known As

Yuan-sheng Ma, Yuansheng Ma

Publications

571

Citations

H-Index

Concepts

All Affiliations

Mentor Technologies IMEC University of Wisconsin–Madison GlobalFoundries (United States)Advanced Micro Devices (United States)

About

Yuansheng Ma is an author at Mentor Technologies specializing in engineering, microelectronics, and computer-aided design.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	11	340
2	Applied Physics	5	5	126
3	Computer Engineering	5	5	143
4	Natural Sciences	3	3	91
5	Chemistry	1	1	42

Yuansheng Ma

Publications

455

Citations

H-Index

Page 1

	Year	Citations
Direct extraction of semiconductor device parameters using lateral optimization method A. Ortíz-Conde, Yuansheng Ma, J. Thomson, Solid-State Electronics Device ModelingElectrical EngineeringEngineeringDirect ExtractionMicroelectronics	1999	63
Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications Yuansheng Ma, J. Andres Torres, Germain Fenger, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2014	52
Line edge roughness impact on critical dimension variation Yuansheng Ma, Harry Levinson, Thomas I. Wallow Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringVlsi DesignSubdivision SurfaceComputer-aided DesignInterconnect (Integrated Circuits)	2007	43
Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography Ivan Junarsa, Mark P. Stoykovich, Paul F. Nealey, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceExtreme Ultraviolet LithographyEngineeringPhotochemistryMicrofabrication	2005	42
Decomposition strategies for self-aligned double patterning Yuansheng Ma, Jason Sweis, Chris Bencher, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Mathematical ProgrammingEngineeringVlsi DesignElectronic Design AutomationComputer Architecture	2010	41
Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer Thomas I. Wallow, Alden Acheta, Yuansheng Ma, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringElectron-beam LithographyPhotoresist LerLine-edge RoughnessBeam Lithography	2007	28
Incorporating DSA in multipatterning semiconductor manufacturing technologies Yasmine Badr, J. Andres Torres, Yuansheng Ma, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Mp DecompositionPatterning StepEngineeringElectronic Design AutomationDigital Manufacturing	2015	28
Line edge roughness of sub-100 nm dense and isolated features: Experimental study Yuansheng Ma, Gene Tsvid, F. Cerrina Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringElectron-beam LithographyMicroscopyNanoscale RoughnessBeam Lithography	2003	24
Line edge roughness and photoresist percolation development model Yuansheng Ma, J. Shin, F. Cerrina Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringWettingComputer-aided DesignPercolation ConceptDissolution Rate	2002	20
Recent Progress in Flexible Fibrous Batteries Zhaowei Xi, Xiang Zhang, Yuansheng Ma, ChemElectroChem EngineeringLithium–sulfur BatteriesBiomedical DevicesRecent ProgressSodium Battery	2018	20

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