Chris Bencher

22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

Chris Bencher, Yong Mei Chen, Huixiong Dai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 128 citations

Physical Design (Electronics), Wafer Scale Processing, Engineering +15

Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab

Chris Bencher, Jeffrey Smith, Liyan Miao et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2011 · 106 citations

Directed self-assembly defectivity assessment. Part II

Chris Bencher, He Yi, Jessica Zhou et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 67 citations

Engineering, Mechanical Engineering, Defect Tolerance +20

Decomposition strategies for self-aligned double patterning

Yuansheng Ma, Jason Sweis, Chris Bencher et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 41 citations

Mathematical Programming, Engineering, Vlsi Design +18

Block copolymer directed self-assembly enables sublithographic patterning for device fabrication

H.‐S. Philip Wong, Chris Bencher, He Yi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 41 citations · Full text

Engineering, Molecular Self-assembly, Pattern Transfer +20