Huixiong Dai

22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

Chris Bencher, Yong Mei Chen, Huixiong Dai et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 128 citations

Physical Design (Electronics), Wafer Scale Processing, Engineering +15

Flexible Control of Block Copolymer Directed Self‐Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning

He Yi, Xinyu Bao, Jie Zhang et al. · Advanced Materials · 2012 · 117 citations

Engineering, Mechanical Engineering, Integrated Circuits +25

Directed self-assembly defectivity assessment. Part II

Chris Bencher, He Yi, Jessica Zhou et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 67 citations

Engineering, Mechanical Engineering, Defect Tolerance +20

Gridded design rule scaling: taking the CPU toward the 16nm node

Christopher Bencher, Huixiong Dai, Yong Mei Chen · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 51 citations

Cluster Computing, Engineering, Vlsi Design +22

SRAM, NAND, DRAM contact hole patterning using block copolymer directed self-assembly guided by small topographical templates

Xinyu Bao, He Yi, Christopher Bencher et al. · 2011 · 43 citations

Engineering, Electron-beam Lithography, Pattern Transfer +27