Christopher Bencher

Flexible Control of Block Copolymer Directed Self‐Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning

He Yi, Jie Zhang, Christopher Bencher et al. · Advanced Materials · 2012 · 117 citations

Engineering, Electrical Engineering, Materials Science +16

Gridded design rule scaling: taking the CPU toward the 16nm node

Christopher Bencher, Huixiong Dai, Yong Mei Chen · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 51 citations

Engineering, Computer Engineering, Electrical Engineering +16

SRAM, NAND, DRAM contact hole patterning using block copolymer directed self-assembly guided by small topographical templates

He Yi, Christopher Bencher, Li‐Wen Chang et al. · 2011 · 43 citations

Engineering, Computer Engineering, Electrical Engineering +14

APF pitch-halving for 22nm logic cells using gridded design rules

Michael C. Smayling, Christopher Bencher, Hao D. Chen et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 30 citations

Engineering, Computer Engineering, Electrical Engineering +13

Generating sub-30-nm polysilicon gates using PECVD amorphous carbon as hardmask and anti-reflective coating

Wei Liu, David Mui, Thorston Lill et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2003 · 19 citations

Natural Sciences, Electrical Engineering, Materials Science +17