Adam R. Pawloski

The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness

Timothy B. Michaelson, Adam R. Pawloski, Alden Acheta et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2005 · 71 citations

Chemical Gradients, Engineering, Electron-beam Lithography +16

Characterization of line-edge roughness in photoresist using an image fading technique

Adam R. Pawloski, Alden Acheta, Ivan Lalovic et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2004 · 57 citations

Measuring acid generation efficiency in chemically amplified resists with all three beams

Charles R. Szmanda, Robert L. Brainard, Joseph F. Mackevich et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 45 citations

Chemical Engineering, Electrical Engineering, Engineering +15

The transfer of photoresist LER through etch

Adam R. Pawloski, Alden Acheta, Scott Bell et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 29 citations

Polysilicon Ler, Electrical Engineering, Polysilicon Gate +9

Line-edge roughness in 193-nm resists: lithographic aspects and etch transfer

Thomas I. Wallow, Alden Acheta, Yuansheng Ma et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2007 · 28 citations

Engineering, Electron-beam Lithography, Photoresist Ler +16