Charles R. Szmanda - Concepedia

Author

Charles R. Szmanda

University at Albany, State University of New York

Also Known As

C. R. Szmanda, C. Szmanda, Charles R. Szmanda, Charles Szmanda

Publications

1.2K

Citations

H-Index

Concepts

All Affiliations

University at Albany, State University of New York Albany State University Magyar Agrár- és Élettudományi Egyetem University of Wisconsin–Madison

About

Charles R. Szmanda is an author at University at Albany, State University of New York specializing in engineering, chemistry, and photochemistry.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	9	9	1.1K
2	Applied Physics	4	4	117
3	Health Sciences	2	2	36
4	Natural Sciences	2	2	69
5	Biostatistics	1	1	27

Charles R. Szmanda

Publications

1.1K

Citations

H-Index

Page 1

	Year	Citations
Programmable polymer thin film and non-volatile memory device Jianyong Ouyang, Chih‐Wei Chu, Charles R. Szmanda, Nature Materials Materials ScienceNon-volatile MemoryEngineeringFlexible ElectronicsNon-volatile Memory Device	2004	878
Measuring acid generation efficiency in chemically amplified resists with all three beams Charles R. Szmanda, Robert L. Brainard, Joseph F. Mackevich, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Chemical EngineeringElectrical EngineeringEngineeringResistorPhotochemistry	1999	45
Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography Craig Higgins, Charles R. Szmanda, Alin Antohe, Japanese Journal of Applied Physics Optical MaterialsEngineeringElectron-beam LithographyOptoelectronic DevicesChemistry	2011	42
On The Dissolution Kinetics Of Positive Photoresists: The Secondary Structure Model Michael K. Templeton, Charles R. Szmanda, Anthony Zampini Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringSeveral Model ResinsComputational ChemistryChemistryMolecular Design	1987	31
Surface Tension Effects In Microlithography - Striations B. K. Daniels, Charles R. Szmanda, Michael K. Templeton, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	1986	28
Simple method for measuring acid generation quantum efficiency at 193 nm Charles R. Szmanda, Robert J. Kavanagh, John F. Bohland, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringQuantum ComputingPhysicsMeasurementCalibration	1999	27
The relationship between critical dimension shift and diffusion in negative chemically amplified resist systems Theodore H. Fedynyshyn, Michael F. Cronin, Charles R. Szmanda Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Materials ScienceMaterials EngineeringEngineeringSpecific ResistancePhysics	1991	26
Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography Charles R. Szmanda, Alin Antohe, Jacque H. Georger, Japanese Journal of Applied Physics	2011	24
Film quantum yields of EUV and ultra-high PAG photoresists Elsayed Hassanein, Craig Higgins, Patrick Naulleau, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringInorganic PhotochemistryChemistryPhotoelectrochemistryChemical Engineering	2008	22
Evaluation of the standard addition method to determine rate constants for acid generation in chemically amplified photoresist at 157 nm Adam R. Pawloski, Charles R. Szmanda, Paul F. Nealey Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringAcid GenerationChemistryChemical EngineeringStandard Addition Method	2001	14

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