Alin Antohe

Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography

Craig Higgins, Charles R. Szmanda, Alin Antohe et al. · Japanese Journal of Applied Physics · 2011 · 42 citations

Optical Materials, Engineering, Electron-beam Lithography +26

RLS tradeoff vs. quantum yield of high PAG EUV resists

Craig Higgins, Alin Antohe, Greg Denbeaux et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 25 citations

Rls Tradeoff, Phosphorescence Imaging, Engineering +15

Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography

Charles R. Szmanda, Alin Antohe, Jacque H. Georger et al. · Japanese Journal of Applied Physics · 2011 · 24 citations

Film quantum yields of EUV and ultra-high PAG photoresists

Elsayed Hassanein, Craig Higgins, Patrick Naulleau et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 22 citations

Engineering, Inorganic Photochemistry, Chemistry +18

A low-loss SiN photonic integrated circuit foundry platform for waveguide-enhanced Raman spectroscopy

Nathan F. Tyndall, Todd H. Stievater, Dmitry A. Kozak et al. · 2021 · 20 citations

Optical Materials, Engineering, Integrated Photonics +23