Evaluation of EUV resist materials for use at the 32 nm half-pitch node

Thomas I. Wallow, Craig Higgins, Robert L. Brainard, +6

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Short Wavelength OpticOptical MaterialsEngineeringElectron-beam LithographyOptical Testing +22

Secondary Electrons in EUV Lithography

Justin Torok, Ryan Del Re, Henry Herbol, +8

Journal of Photopolymer Science and Technology

EngineeringElectron-beam LithographyMonte-carlo ModellingPhysicsPhotochemistry +12

Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography

Craig Higgins, Charles R. Szmanda, Alin Antohe, +3

Japanese Journal of Applied Physics

Optical MaterialsEngineeringElectron-beam LithographyOptoelectronic DevicesChemistry +24

What We Don’t Know About EUV Exposure Mechanisms

Amrit Narasimhan, Liam Wisehart, Steven Grzeskowiak, +3

Journal of Photopolymer Science and Technology

Optical MaterialsEuv Exposure MechanismsEngineeringElectron-beam LithographyRadiation Exposure +18

RLS tradeoff vs. quantum yield of high PAG EUV resists

Craig Higgins, Alin Antohe, Greg Denbeaux, +3

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

Rls TradeoffPhosphorescence ImagingEngineeringHealth SciencesPhysics +13

Acid Generation Efficiency of EUV PAGs via Low Energy Electron Exposure

Steven Grzeskowiak, Amrit Narasimhan, Eliran Rebeyev, +3

Journal of Photopolymer Science and Technology

Electrical EngineeringChemical EngineeringEngineeringBeam LithographyPhotochemistry +12

Electron trapping: a mechanism for acid production in extreme ultraviolet photoresists

Steven Grzeskowiak, Jake Kaminsky, Sean Gibbons, +3

Journal of Micro/Nanolithography MEMS and MOEMS

Ultraviolet LightEngineeringPhotobiologyChemistryPhotoelectrochemistry +17

Magnetization reversal study of CoCrPt alloy thin films on a nanogranular-length scale using magnetic transmission soft x-ray microscopy

Mi‐Young Im, Peter Fischer, Thomas Eimüller, +2

Applied Physics Letters

Alloy Thin FilmsEngineeringMagnetization Reversal StudyCocrpt SystemsMagnetic Resonance +21

Electron Penetration Depths in EUV Photoresists

Justin Torok, Bharath Srivats, Shahid Hussain Memon, +6

Journal of Photopolymer Science and Technology

EngineeringDiffusion LengthElectron-beam LithographyMicroscopyElectron Optic +14

Analytical techniques for mechanistic characterization of EUV photoresists

Steven Grzeskowiak, Amrit Narasimhan, Michael Murphy, +4

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMicroscopyOptic DesignChemistry +19