Greg Denbeaux

Evaluation of EUV resist materials for use at the 32 nm half-pitch node

Thomas I. Wallow, Craig Higgins, Robert L. Brainard et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 107 citations

Short Wavelength Optic, Optical Materials, Engineering +24

Secondary Electrons in EUV Lithography

Justin Torok, Ryan Del Re, Henry Herbol et al. · Journal of Photopolymer Science and Technology · 2013 · 97 citations · Full text

Engineering, Electron-beam Lithography, Monte-carlo Modelling +14

Resolution, Line-Edge Roughness, Sensitivity Tradeoff, and Quantum Yield of High Photo Acid Generator Resists for Extreme Ultraviolet Lithography

Craig Higgins, Charles R. Szmanda, Alin Antohe et al. · Japanese Journal of Applied Physics · 2011 · 42 citations

Optical Materials, Engineering, Electron-beam Lithography +26

What We Don’t Know About EUV Exposure Mechanisms

Amrit Narasimhan, Liam Wisehart, Steven Grzeskowiak et al. · Journal of Photopolymer Science and Technology · 2017 · 40 citations · Full text

Optical Materials, Euv Exposure Mechanisms, Engineering +20

RLS tradeoff vs. quantum yield of high PAG EUV resists

Craig Higgins, Alin Antohe, Greg Denbeaux et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 25 citations

Rls Tradeoff, Phosphorescence Imaging, Engineering +15