Ryan Del Re - Concepedia

Author

Ryan Del Re

SUNY New Paltz

Also Known As

, Ryan Del Re

Publications

625

Citations

H-Index

Concepts

All Affiliations

SUNY New Paltz Paul Scherrer Institute Center for Nanoscale Science and Technology Purchase College SUNY Polytechnic Institute

About

Ryan Del Re is an author at SUNY New Paltz specializing in photochemistry, engineering, and chemistry.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	538
2	Chemistry	7	7	369
3	Applied Physics	4	4	361
4	Natural Sciences	3	3	192
5	Macromolecular Science	1	1	52

Ryan Del Re

Publications

625

Citations

H-Index

Page 1

	Year	Citations
Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm) Brian Cardineau, Ryan Del Re, Miles Wilklow‐Marnell, Microelectronic Engineering Materials ScienceEngineeringPhotochemistryInorganic PhotochemistryOptical Properties	2014	169
Secondary Electrons in EUV Lithography Justin Torok, Ryan Del Re, Henry Herbol, Journal of Photopolymer Science and Technology EngineeringElectron-beam LithographyMonte-carlo ModellingPhysicsPhotochemistry	2013	97
EUV resists based on tin-oxo clusters Brian Cardineau, Ryan Del Re, Hashim Al-Mashat, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE EngineeringInorganic PhotochemistryEuv LightSynthetic PhotochemistryEuv Resists	2014	57
Platinum and palladium oxalates: positive-tone extreme ultraviolet resists Miriam Sortland, Jodi Hotalen, Ryan Del Re, Journal of Micro/Nanolithography MEMS and MOEMS Materials ScienceInorganic ChemistryEngineeringPhotochemistryUv-vis Spectroscopy	2015	57
Low-line edge roughness extreme ultraviolet photoresists of organotin carboxylates Ryan Del Re, James Passarelli, Miriam Sortland, Journal of Micro/Nanolithography MEMS and MOEMS Materials ScienceOrganic Material ChemistryOptical MaterialsExtreme Ultraviolet LithographyElectronic Materials	2015	53
Organometallic carboxylate resists for extreme ultraviolet with high sensitivity James Passarelli, Michael Murphy, Ryan Del Re, Journal of Micro/Nanolithography MEMS and MOEMS Macromolecular ChemistryEngineeringResponsive PolymersOrganic ChemistryChemistry	2015	52
High-sensitivity molecular organometallic resist for EUV (MORE) James Passarelli, Michael Murphy, Ryan Del Re, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2015	51
Bismuth Resists for EUV Lithography James Passarelli, Miriam Sortland, Ryan Del Re, Journal of Photopolymer Science and Technology Materials SciencePreliminary Lithographic EvaluationEngineeringBismuth ResistsPhysics	2014	38
Low-LER tin carboxylate photoresists using EUV Ryan Del Re, Miriam Sortland, James Pasarelli, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2015	21
EUV resists comprised of main group organometallic oligomeric materials James Passarelli, Brian Cardineau, Ryan Del Re, Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE	2014	15

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