IEEE Electron Device Letters · 2013 · 11 citations · 5 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsPackaging DesignSemiconductor DevicesChip PackagingIntegrated Circuit DesignPackaging EngineeringPackaging MaterialsSemiconductor Device MaterialsSemiconductor ReliabilityAdvanced PackagingHermetic PackagingLeakageManufacturabilityThree-dimensional IntegrationThrough-silicon Via DesignThrough-silicon Via PackagingThrough-silicon Vias
An advanced crystal resonator device scheme using Cu through-silicon via (TSV), 3-D integration, and Si packaging technologies is successfully demonstrated. In addition to robust structural quality, the crystal resonator packaging has excellent electrical characteristics of low leakage current and reliability against harsh environment for MIL-STD-883 hermetic encapsulation. Using 3-D integration technologies and Si packaging, the proposed TSV-based crystal resonator device possesses the manufacturability potential while conventional ones using a metal lid or ceramic enclosure.
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Three-dimensional integrated circuits
Anna W. Topol, Douglas Charles La Tulipe, D.J. Frank et al. · IBM Journal of Research and Development · 2006 · 701 citations
Engineering, Computer Engineering, Electrical Engineering +17
Novel Cu plating formula for filling through silicon vias
Shao-Ping Shen, Wei‐Ping Dow, Motonobu Kubo et al. · 2009 · 16 citations
Engineering, Electrical Engineering, Materials Engineering +17