XPS study of the degradation mechanism of fluorinated anti-sticking treatments used in UV nanoimprint lithography

Imprint of sub-25 nm vias and trenches in polymers

Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Applied Physics Letters · 1995 · 2.7K citations

Engineering, Manufacturing Engineering, Materials Science +15

Mold-assisted nanolithography: A process for reliable pattern replication

J. Haisma, M.J. Verheijen, Kees van den Heuvel et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 656 citations

Engineering, Materials Engineering, Materials Science +11

Improving stamps for 10 nm level wafer scale nanoimprint lithography

M. Beck, Mariusz Graczyk, Ivan Maximov et al. · Microelectronic Engineering · 2002 · 268 citations

Engineering, Materials Engineering, Materials Science +14

Controlled co-evaporation of silanes for nanoimprint stamps

Helmut Schift, Sina Saxer, Sunggook Park et al. · Nanotechnology · 2005 · 129 citations

Natural Sciences, Materials Engineering, Materials Science +17

Mold Surface Treatment for Imprint Lithography.

Yoshihiko Hirai, Satoshi Yoshida, Akio Okamoto et al. · Journal of Photopolymer Science and Technology · 2001 · 106 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17