Nanoimprint Lithography

Nanoimprint Lithography is a nanofabrication technique that belongs to the class of lithographic methods, distinguished by its use of a physical mold or stamp to mechanically deform a resist material on a substrate, thereby creating nanoscale patterns through direct embossing.

2.1K

Publications

99.6K

Citations

6.7K

Authors

1.2K

Institutions

Publications per year

2017–2026

429

Authors

6.7K

  1. SY
    Stephen Y. Chou

    Princeton University, United States

    56 publications · 9.8K citations

    39

    h-index

  2. LJ
    L. Jay Guo

    University of Michigan, United States

    39 publications · 6.8K citations

    29

    h-index

  3. WW
    Wei Wu

    University of Southern California, United States

    37 publications · 3.2K citations

    27

    h-index

  4. HL
    Heon Lee

    Korea University, South Korea

    51 publications · 2.1K citations

    25

    h-index

  5. HS
    Helmut Schift

    Paul Scherrer Institute, Switzerland

    37 publications · 1.4K citations

    21

    h-index

1–5 of 6.7K

Venues

  1. Microelectronic Engineering

    240 publications · 7.8K citations

    46

    h-index

  2. 44

    h-index

  3. Applied Physics Letters

    98 publications · 9.4K citations

    44

    h-index

  4. Nano Letters

    57 publications · 6.4K citations

    44

    h-index

  5. Advanced Materials

    61 publications · 7.1K citations

    42

    h-index

1–5