Concepedia

Flash Imprint Lithography

Flash Imprint Lithography is a resist-based nanoimprint lithography technique that uses a photocurable liquid monomer rapidly solidified by intense light pulses to replicate nanoscale patterns from a mold in a single, fast imprinting cycle.

116

Publications

5.2K

Citations

307

Authors

66

Institutions

Publications per year

2017–2026

1

Variants

Fil

Parents

Publications

116

Step and flash imprint lithography: a new approach to high-resolution patterning

Matthew Colburn, Stephen C. Johnson, M. D. Stewart et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 564 citations

, , +16

Step and flash imprint lithography: Template surface treatment and defect analysis

T. C. Bailey, Byung Jin Choi, Matthew Colburn et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 359 citations

, , +14

Recent progress in high resolution lithography

Daniel Bratton, Da Yang, Jun Yan Dai et al. · Polymers for Advanced Technologies · 2006 · 252 citations

, , +11

Effect of Shape, Size, and Aspect Ratio on Nanoparticle Penetration and Distribution inside Solid Tissues Using 3D Spheroid Models

Rachit Agarwal, Patrick Jurney, Mansi Raythatha et al. · Advanced Healthcare Materials · 2015 · 156 citations · Full text

, , +17

Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography

Paul Ruchhoeft, Matthew Colburn, Byung Jin Choi et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1999 · 154 citations

, , +13

1–5 of 116

Authors

307

  1. CG
    C. Grant Willson

    The University of Texas at Austin, United States

    41 publications · 3K citations

    28

    h-index

  2. SV
    S. V. Sreenivasan

    The University of Texas at Austin, United States

    34 publications · 2.2K citations

    22

    h-index

  3. DJ
    Douglas J. Resnick

    Motorola (United States), United States

    32 publications · 1.1K citations

    19

    h-index

  4. JG
    John G. Ekerdt

    The University of Texas at Austin, United States

    19 publications · 1.9K citations

    18

    h-index

  5. KJ
    Kevin J. Nordquist

    Motorola (United States), United States

    15 publications · 584 citations

    13

    h-index

1–5 of 307

Institutions

66

  1. The University of Texas at Austin

    Austin, United States

    32 h-index

    276 publications

    23.1K citations

  2. Motorola (United States)

    Schaumburg, United States

    16 h-index

    101 publications

    3.9K citations

  3. Canon (United States)

    Melville, United States

    5 h-index

    17 publications

    320 citations

  4. Canon (Japan)

    Tokyo, Japan

    5 h-index

    28 publications

    412 citations

  5. Physical Sciences (United States)

    Andover, United States

    4 h-index

    25 publications

    1.2K citations

  6. The University of Osaka

    Osaka, Japan

    4 h-index

    4 publications

    93 citations

  7. Toyama Prefectural University

    Imizu, Japan

    4 h-index

    4 publications

    93 citations

  8. Nissan Chemical Corporation (Japan)

    Tokyo, Japan

    3 h-index

    4 publications

    112 citations

1–8 of 66

Venues

  1. 19

    h-index

  2. 16

    h-index

  3. Microelectronic Engineering

    12 publications · 360 citations

    10

    h-index

  4. 8

    h-index

  5. Journal of Photopolymer Science and Technology

    4 publications · 152 citations

    4

    h-index

1–5