Concepedia

Continuous Imprint Processing

Continuous Imprint Processing is a nanoimprint lithography technique that belongs to the class of roll-to-roll manufacturing processes, distinguished by its ability to achieve high-throughput, large-area patterning through the continuous synchronization of a flexible substrate with a moving imprint mold.

21

Publications

2.2K

Citations

90

Authors

27

Institutions

Publications per year

2017–2026

5

Parents

Publications

21

Large-Area Roll-to-Roll and Roll-to-Plate Nanoimprint Lithography: A Step toward High-Throughput Application of Continuous Nanoimprinting

Se Hyun Ahn, L. Jay Guo · ACS Nano · 2009 · 659 citations

, , +17

High‐Speed Roll‐to‐Roll Nanoimprint Lithography on Flexible Plastic Substrates

Se Hyun Ahn, L. Jay Guo · Advanced Materials · 2008 · 617 citations · Full text

, , +11

Recent developments and design challenges in continuous roller micro- and nanoimprinting

Jarrett Dumond, Hong Yee Low · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2011 · 112 citations

, , +17

Mold Surface Treatment for Imprint Lithography.

Yoshihiko Hirai, Satoshi Yoshida, Akio Okamoto et al. · Journal of Photopolymer Science and Technology · 2001 · 106 citations · Full text

, , +17

Continuous ultraviolet roll nanoimprinting process for replicating large-scale nano- and micropatterns

Suho Ahn, Joowon Cha, Ho Myung et al. · Applied Physics Letters · 2006 · 102 citations

, , +14

1–5 of 21

Authors

90

  1. LJ
    L. Jay Guo

    University of Michigan, United States

    3 publications · 1.3K citations

    3

    h-index

  2. SH
    Se Hyun Ahn

    University of Michigan, United States

    3 publications · 1.3K citations

    3

    h-index

  3. HS
    Helmut Schift

    Paul Scherrer Institute, Switzerland

    1 publications · 14 citations

    1

    h-index

  4. JJ
    James J. Watkins

    University of Massachusetts Amherst, United States

    1 publications · 80 citations

    1

    h-index

  5. TK
    Tae‐il Kim

    Sungkyunkwan University, South Korea

    1 publications · 43 citations

    1

    h-index

1–5 of 90

Institutions

27

  1. University of Michigan

    Ann Arbor, United States

    4 h-index

    7 publications

    2.6K citations

  2. University of Massachusetts Amherst

    Amherst Center, United States

    2 h-index

    7 publications

    482 citations

  3. Shanghai Jiao Tong University

    Shanghai, China

    2 h-index

    6 publications

    260 citations

  4. Yonsei University

    Seoul, South Korea

    2 h-index

    9 publications

    594 citations

  5. Michigan United

    Kalamazoo, United States

    1 h-index

    2 publications

    32 citations

  6. Technology Research Institute of Osaka Prefecture

    Izumi, Japan

    1 h-index

    1 publications

    106 citations

  7. Nanjing Normal University

    Nanjing, China

    1 h-index

    4 publications

    144 citations

  8. Centro Ricerche FIAT

    Orbassano, Italy

    1 h-index

    1 publications

    73 citations

1–8 of 27

Venues

  1. Microelectronic Engineering

    3 publications · 128 citations

    3

    h-index

  2. Nanotechnology

    2 publications · 94 citations

    2

    h-index

  3. ACS Nano

    2 publications · 680 citations

    2

    h-index

  4. 2

    h-index

  5. Journal of Colloid and Interface Science

    1 publications · 15 citations

    1

    h-index

1–5