J. Boussey

Improved release strategy for UV nanoimprint lithography

Sophie Garidel, M. Zelsmann, N. Chaix et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 57 citations

Engineering, Electron-beam Lithography, Surface Nanotechnology +22

Analytic modeling, optimization, and realization of cooling devices in silicon technology

M. Coyaud, C. Schaeffer, J. Boussey et al. · IEEE Transactions on Components and Packaging Technologies · 2000 · 52 citations

Engineering, Liquid Metal Cooling, Energy Efficiency +20

A miniature silicon hot wire sensor for automatic wind speed measurements

Mourad Laghrouche, A. Adane, J. Boussey et al. · Renewable Energy · 2005 · 49 citations · Full text

Engineering, Sensors, Measurement +8

XPS study of the degradation mechanism of fluorinated anti-sticking treatments used in UV nanoimprint lithography

Delphine Truffier‐Boutry, A. Beaurain, R. Galand et al. · Microelectronic Engineering · 2009 · 44 citations

Materials Science, Engineering, Beam Lithography +12

Chemical degradation of fluorinated antisticking treatments in UV nanoimprint lithography

Delphine Truffier‐Boutry, M. Zelsmann, J. de Girolamo et al. · Applied Physics Letters · 2009 · 37 citations

Materials Science, Chemical Engineering, Imprint Stamps +15