Concepedia

Template Durability

Template Durability is a performance metric in nanoimprint lithography that quantifies the resistance of a mold or stamp to deformation, wear, and contamination over repeated imprint cycles, thereby ensuring consistent pattern fidelity and defect control during high-throughput nanofabrication.

23

Publications

968

Citations

111

Authors

39

Institutions

Publications per year

2017–2026

3

Parents

Publications

23

Step and flash imprint lithography: Template surface treatment and defect analysis

T. C. Bailey, Byung Jin Choi, Matthew Colburn et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 359 citations

, , +14

Large-area, continuous roll-to-roll nanoimprinting with PFPE composite molds

Jacob John, Tang Yuying, Jonathan P. Rothstein et al. · Nanotechnology · 2013 · 80 citations

, , +16

Nano-Imprint Lithography Using Replicated Mold by Ni Electroforming

Yoshihiko Hirai, Satoshi Harada, Satoshi Isaka et al. · Japanese Journal of Applied Physics · 2002 · 61 citations

, , +12

XPS study of the degradation mechanism of fluorinated anti-sticking treatments used in UV nanoimprint lithography

Delphine Truffier‐Boutry, A. Beaurain, R. Galand et al. · Microelectronic Engineering · 2009 · 44 citations

, , +17

Wafer‐Level Self‐Organized Copolymer Templates for Nanolithography with Sub‐50 nm Feature and Spatial Resolutions

Sivashankar Krishnamoorthy, Krishna Kumar Manipaddy, Fung Ling Yap · Advanced Functional Materials · 2011 · 38 citations

, , +17

1–5 of 23

Authors

111

  1. MZ
    M. Zelsmann

    Centre National de la Recherche Scientifique, France

    3 publications · 77 citations

    3

    h-index

  2. AF
    Achille Francone

    Institució Catalana de Recerca i Estudis Avançats, Spain

    2 publications · 33 citations

    2

    h-index

  3. AB
    A. Beaurain

    Centre National de la Recherche Scientifique, France

    2 publications · 65 citations

    2

    h-index

  4. AR
    A. Retolaza

    Tekniker, Spain

    2 publications · 31 citations

    2

    h-index

  5. JT
    Jun Taniguchi

    Tokyo University of Science, Japan

    2 publications · 26 citations

    2

    h-index

1–5 of 111

Institutions

39

  1. Samsung (South Korea)

    Seoul, South Korea

    2 h-index

    9 publications

    148 citations

  2. Commissariat à l'Énergie Atomique et aux Énergies Alternatives

    Paris, France

    2 h-index

    12 publications

    336 citations

  3. Fraunhofer Institute for Integrated Systems and Device Technology

    Erlangen, Germany

    2 h-index

    10 publications

    312 citations

  4. Tokyo University of Science

    Tokyo, Japan

    2 h-index

    5 publications

    67 citations

  5. CEA Grenoble

    Grenoble, France

    2 h-index

    12 publications

    336 citations

  6. Tekniker

    Eibar, Spain

    2 h-index

    6 publications

    93 citations

  7. Laboratoire d'Électronique des Technologies de l'Information

    Grenoble, France

    2 h-index

    10 publications

    312 citations

  8. Université Grenoble Alpes

    Saint-Martin-d'Hères, France

    2 h-index

    9 publications

    300 citations

1–8 of 39

Venues

  1. Microelectronic Engineering

    16 publications · 365 citations

    13

    h-index

  2. Nanotechnology

    1 publications · 80 citations

    1

    h-index

  3. 1

    h-index

  4. Japanese Journal of Applied Physics

    JJAP · 1 publications · 61 citations

    1

    h-index

  5. Journal of Materials Chemistry

    1 publications · 20 citations

    1

    h-index

1–5