Tri-Gate Transistor Architecture with High-k Gate Dielectrics, Metal Gates and Strain Engineering

J. Kavalieros, Barry M. Doyle, Suman Datta, +10

Semiconductor TechnologyElectrical EngineeringMetal Gate ElectrodesEngineeringPmos Trigate Transistors +9

Electrostatics improvement in 3-D tri-gate over ultra-thin body planar InGaAs quantum well field effect transistors with high-K gate dielectric and scaled gate-to-drain/gate-to-source separation

M. Radosavljević, G. Dewey, Dipanjan Basu, +17

SemiconductorsSemiconductor TechnologyElectrical EngineeringElectronic DevicesHigh-k Gate Dielectric +13

Advanced high-K gate dielectric for high-performance short-channel In<inf>0.7</inf>Ga<inf>0.3</inf>As quantum well field effect transistors on silicon substrate for low power logic applications

M. Radosavljević, B. Chu-Kung, S. Corcoran, +12

Semiconductor TechnologyElectrical EngineeringEngineeringField Effect TransistorsNanoelectronics +11

Non-planar, multi-gate InGaAs quantum well field effect transistors with high-K gate dielectric and ultra-scaled gate-to-drain/gate-to-source separation for low power logic applications

M. Radosavljević, G. Dewey, J. M. Fastenau, +13

Semiconductor TechnologyElectrical EngineeringHigh-k Gate DielectricEngineeringPhysics +10

High mobility strained germanium quantum well field effect transistor as the p-channel device option for low power (Vcc = 0.5 V) III–V CMOS architecture

R. Pillarisetty, B. Chu-Kung, S. Corcoran, +16

EngineeringApplied AlgebraSemiconductor DeviceElectronic EngineeringField Effect Transistor +14

Floating Body Cell with Independently-Controlled Double Gates for High Density Memory

Ibrahim Ban, Uygar E. Avci, Uday Shah, +3

Non-volatile MemoryElectrical EngineeringIdg Fbc DevicesIdg FbcEngineering +13

Improvement in linewidth roughness by postprocessing

Manish Chandhok, Kent Frasure, E. Steve Putna, +4

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

Optical MaterialsEngineeringElectron-beam LithographyComputer-aided DesignBeam Lithography +16

In vivo and in vitro evaluation of three controlled release principles of 6-N-cyclohexyl-2′-O-methyladenosine

Alan E. Royce, Shoufeng Li, Margaret L. Weaver, +1

Journal of Controlled Release

Molecular PharmacologyPharmaceutical ScienceBiochemistryMedicineControlled Release Principles +3

EUV lithography for 22nm half pitch and beyond: exploring resolution, LWR, and sensitivity tradeoffs

E. Steve Putna, Todd R. Younkin, Michael Leeson, +4

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

EngineeringElectron-beam LithographyMicroscopyEuv LithographyTarget Fabrication +20

Exposing extreme ultraviolet lithography at Intel

J. M. Roberts, Terence Bacuita, Robert Bristol, +11

Microelectronic Engineering

Extreme Ultraviolet LithographyEngineeringElectron-beam LithographyMicrofabricationBeam Lithography +2