Concepedia

Kent Frasure

KF

Statistics

Publications

3

Citations

90

H-Index

3

Active since

2008

Affiliations

Intel (United States)(Current)

Kent Frasure is an author at Intel (United States) specializing in materials science, engineering, and resist patterning.

Publications per year

2008–2014

3

Publications

3

Improvement in linewidth roughness by postprocessing

Manish Chandhok, Kent Frasure, E. Steve Putna et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2008 · 38 citations · Full text

Engineering, Materials Engineering, Materials Science +16

Investigation of novel inorganic resist materials for EUV lithography

Marie Krysak, James M. Blackwell, Steve Putna et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 28 citations

Natural Sciences, Materials Engineering, Materials Science +14

EUV lithography for 30nm half pitch and beyond: exploring resolution, sensitivity, and LWR tradeoffs

E. Steve Putna, Todd R. Younkin, Manish Chandhok et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 24 citations

Engineering, Electrical Engineering, Materials Science +15

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